Integrated processing system having multiple reactors connected to a central chamber
US6776846B2 · kind B2 · utility
2Cited by
20References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2002 |
| Grant date | Aug 17, 2004 |
| Priority date | — |
| Expiry date | Apr 25, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/141
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An integrated wafer processing system having a wafer queuing station and a plurality of plasma reactors connected to peripheral walls of a central vacuum chamber. Vacuum valves separate the central chamber from the queuing station and the plasma reactors. A wafer transfer arm capable of R-&THgr; motion can transfer wafers between the queuing station and any of the plasma reactors in either a single-step or a multi-step process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.