Imaging apparatus

US6778257B2 · kind B2 · utility

Assignee

• ASML NETHERLANDS B.V. · NL

Inventors

• Arno Jan Bleeker · Westerhoven, NL
• Pieter Willem Herman De Jager · Middelbeers, NL
• Jason Hintersteiner · Bethel, US
• Borgert Kruizinga · Zoetermeer, NL
• Matthew Eugene McCarthy · Brookfield, US
• Mark Oskotsky · Mamaroneck, US
• Lev Ryzhikov · Norwalk, US
• Lev Sakin · Stamford, US
• Stanislav Smirnov · Bethel, US
• Bart Snijders · Rotterdam, NL
• Karel Diederick Van Der Mast · Emmeloord, NL
• Huibert Visser · Zevenhuizen, NL

Key dates

• Filing date: Jul 23, 2002
• Grant date: Aug 17, 2004
• Expiry date: Jul 23, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70291
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.