Jason Hintersteiner
20Patents
5h-index
29Co-inventors
65Inventor score
Filing activity: Jul 23, 2002 → Jun 27, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6778257B2 | Imaging apparatus | Physics | 479 | Expired |
| US6831768B1 | Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography | Physics | 15 | Expired |
| US7061591B2 | Maskless lithography systems and methods utilizing spatial light modulator arrays | Physics | 13 | Expired |
| US7006295B2 | Illumination system and method for efficiently illuminating a pattern generator | Physics | 8 | Expired |
| US7936445B2 | Altering pattern data based on measured optical element characteristics | Physics | 6 | Active |
| US7023525B2 | Imaging apparatus | Physics | 5 | Expired |
| US8259285B2 | Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data | Physics | 4 | Active |
| US7046413B2 | System and method for dose control in a lithographic system | Physics | 3 | Expired |
| US6985280B2 | Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography | Physics | 2 | Expired |
| US8009269B2 | Optimal rasterization for maskless lithography | Physics | 2 | Active |
| US7567368B2 | Systems and methods for minimizing scattered light in multi-SLM maskless lithography | Physics | 2 | Expired |
| US7542013B2 | System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode | Physics | 1 | Active |
| US7859735B2 | Systems and methods for minimizing scattered light in multi-SLM maskless lithography | Physics | 1 | Active |
| US8064122B2 | Apertured window for enabling flexible illumination overfill of patterning devices | Physics | 1 | Active |
| US7158307B2 | Efficiently illuminating a modulating device | Physics | 1 | Expired |
| US6989920B2 | System and method for dose control in a lithographic system | Physics | 1 | Expired |
| US7403266B2 | Maskless lithography systems and methods utilizing spatial light modulator arrays | Physics | 1 | Expired |
| US7463402B2 | Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography | Physics | 1 | Active |
| US9544831B2 | System and method for network user isolation | Electricity | 0 | Active |
| US9641307B2 | System and method for wireless access point layout and network operation | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.