Semiconductor wafer tilt monitoring on semiconductor fabrication equipment plate
US6778266B2 · kind B2 · utility
2Cited by
12References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 12, 2002 |
| Grant date | Aug 17, 2004 |
| Priority date | — |
| Expiry date | Feb 12, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/26
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Monitoring semiconductor wafer tilt, such as in conjunction with semiconductor fabrication equipment having a cooling and or a heating plate, is disclosed. A system for such monitoring includes one or more light sources and one or more light detectors. Each light source generates light that is reflected by the semiconductor wafer. Each light detector senses a detected light value of the light reflected by the semiconductor wafer. If the detected light value deviates from a normal value corresponding to no wafer tilt, then this indicates that the semiconductor wafer has tilted.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.