Patent · US Expired

Laterally interconnecting structures

US6784102B2 · kind B2 · utility

2Cited by
4References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 9, 2002
Grant dateAug 31, 2004
Priority date
Expiry dateOct 10, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method of increasing mechanical interlocking between a first structure and a second adjacent structure in an integrated circuit. The first structure is formed with a first surface having a first horizontal component, and the second structure is formed with a second surface having a second horizontal component. The first surface laterally engages the second surface and the first horizontal component is complementary to the second horizontal component, such that the first structure prohibits vertical movement of the second structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.