Method, system, and apparatus for management of reaction loads in a lithography system
US6784978B2 · kind B2 · utility
9Cited by
15References
34Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 12, 2002 |
| Grant date | Aug 31, 2004 |
| Priority date | — |
| Expiry date | May 29, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure is supported by a non-isolated structure. The isolated structure supports a moveable stage. A linear motor includes a first linear motor element and a second linear motor element. The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates mount the second linear motor element on the isolated structure. A flexure rod is coupled between the non-isolated structure and the second linear motor element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.