Stage device, exposure apparatus and method
US6788385B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 30, 2002 |
| Grant date | Sep 7, 2004 |
| Priority date | — |
| Expiry date | Apr 30, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a stage device of an exposure apparatus, a first stage is driven in the X-axis direction by a first X-axis motor while being supported at one side by a first guide bar, and a second stage is driven in the X-axis direction by a second X-axis motor while being supported at one side by a second guide bar. The first guide bar and the second guide bar are independently driven in the Y-axis direction by a Y-axis linear motor. In a state in which the first guide bar and the second guide bar are closest to each other, the end of the first stage opposite from the side supported by the first guide bar is placed above the second guide bar, and the end of the second stage opposite from the side supported by the second guide bar is placed above the first guide bar. First and second substrate tables are supported above the first and second stages, respectively, via first and second minutely driving devices. The above configuration of the stage device permits and restrains a change in attitude of each stage due to driving of the substrate table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.