Method and scanning electron microscope for measuring dimension of material on sample
US6791084B2 · kind B2 · utility
29Cited by
3References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 19, 2002 |
| Grant date | Sep 14, 2004 |
| Priority date | — |
| Expiry date | Sep 19, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2814
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.