Composition and method for polishing rigid disks
US6793559B2 · kind B2 · utility
3Cited by
16References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 5, 2002 |
| Grant date | Sep 21, 2004 |
| Priority date | — |
| Expiry date | Apr 4, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/044
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for polishing computer rigid disks comprising bringing at least one surface of the rigid disk into contact with a polishing pad and applying a composition to the rigid disk comprising at least one hydroxylamine additive and colloidal silica to give polished rigid disk.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.