Gas distribution showerhead
US6793733B2 · kind B2 · utility
81Cited by
33References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 25, 2002 |
| Grant date | Sep 21, 2004 |
| Priority date | — |
| Expiry date | Jan 25, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/455
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas distribution showerhead for use in a semiconductor fabrication process features a face plate having gas outlet ports in the form of elongated slots or channels. The use of elongated gas outlet ports in accordance with embodiments of the present invention substantially reduces the incidence of undesirable spotting and streaking of deposited material where the showerhead is closely spaced from the wafer. A showerhead featuring a face plate having a tapered profile to reduce edge thickness of deposited material at close face plate-to-wafer spacings is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.