Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US6795169B2 · kind B2 · utility
256Cited by
79References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 7, 2003 |
| Grant date | Sep 21, 2004 |
| Priority date | — |
| Expiry date | Mar 7, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70791
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus having a plurality of projection optical systems where each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate. The exposure apparatus also includes a substrate stage which holds the substrate and which moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction, and the projection optical systems and the substrate relatively move during a pattern projecting operation along the scanning direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.