Electron beam system using multiple electron beams
US6797953B2 · kind B2 · utility
19Cited by
22References
39Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2002 |
| Grant date | Sep 28, 2004 |
| Priority date | — |
| Expiry date | Feb 22, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3177
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam system uses multiple electron columns to increase throughput. One or more multiple electron emitters are in one or more vacuum sealable gun chambers to allow the gun chamber to be replaced with electrons guns having emitters that have been previously conditioned so that the system does not need to be out of service to condition the newly installed emitters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.