Stabilized oscillator circuit for plasma density measurement
US6799532B2 · kind B2 · utility
5Cited by
45References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 29, 2003 |
| Grant date | Oct 5, 2004 |
| Priority date | — |
| Expiry date | Aug 29, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/0081
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and system for controlling electron densities in a plasma processing system. By applying a dither voltage and a correction voltage to a voltage-controlled oscillator, electron (plasma) density of a plasma processing system (acting as an open resonator) may be measured and controlled as part of a plasma-based process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.