Patent · US Expired

Semiconductor wafer processing apparatus

US6799932B2 · kind B2 · utility

5Cited by
30References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 9, 2003
Grant dateOct 5, 2004
Priority date
Expiry dateJul 22, 2023

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/14
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A processor for processing articles, such as semiconductor wafers, in a substantially clean atmosphere is set forth. The processor includes an enclosure defining a substantially enclosed clean processing chamber and at least one processing station disposed in the processing chamber. An interface section is disposed adjacent an interface end of the enclosure. The interface section includes at least one interface port through which a pod containing articles for processing are loaded or unloaded to or from the processor. The interface section is hygienically separated from the processing chamber since the interface section is generally not as clean as the highly hygienic processing chamber. An article extraction mechanism adapted to seal with the pod is employed. The mechanism is disposed to allow extraction of the articles contained within the pod into the processing chamber without exposing the articles to ambient atmospheric conditions in the interface section. The article processor also preferably includes an article insertion mechanism that is adapted to seal with a pod disposed in the interface section. The article insertion mechanism is disposed to allow insertion of the articl…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.