Organic anti-reflective coating material and preparation thereof
US6803172B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 16, 2002 |
| Grant date | Oct 12, 2004 |
| Priority date | — |
| Expiry date | Nov 7, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An organic anti-reflective material, in particular one which prevents back reflection from the surface of or lower layers in the semiconductor device and eliminates the standing waves and reflective notching due to the optical properties of lower layers on the wafer, and due to the changes in the thickness of the photosensitive film applied thereon. The organic anti-reflective polymer is useful for forming ultrafine patterns of 64M, 256M, 1G, and 4G DRAM semiconductor devices. A composition containing such an organic anti-reflective polymer, and an anti-reflective coating formed therefrom and a preparation method thereof are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.