Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream
US6805728B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2002 |
| Grant date | Oct 19, 2004 |
| Priority date | — |
| Expiry date | Dec 9, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2259/4146
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus and process for abating at least one acid or hydride gas component or by-product thereof, from an effluent stream deriving from a semiconductor manufacturing process, comprising, a first sorbent bed material having a high capacity sorbent affinity for the acid or hydride gas component, a second and discreet sorbent bed material having a high capture rate sorbent affinity for the same gas component, and a flow path joining the process in gas flow communication with the sorbent bed materials such that effluent is flowed through the sorbent beds, to reduce the acid or hydride gas component. The first sorbent bed material preferably comprises basic copper carbonate and the second sorbent bed preferably comprises at least one of, CuO, AgO, CoO, Co3O4, ZnO, MnO2 and mixtures thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.