Substrate processing apparatus
US6805769B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 10, 2001 |
| Grant date | Oct 19, 2004 |
| Priority date | — |
| Expiry date | Jul 17, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B3/024
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Reaction products produced under dry etching attach to a substrate undergoing dry etching. It is necessary to remove the reaction products for the next step. Therefore, in the case of the background art, the processing of supplying a remover for reaction products, an intermediate rinse for washing away the remover, and deionized water to a substrate in order is performed.The above processing is conventionally performed under an atmospheric atmosphere. Therefore, a thin film may be changed in quality due to atmospheric components.Therefore, a substrate processing apparatus of the present invention uses means for blowing nitrogen gas on a substrate and supplies a remover to the substrate while blowing nitrogen. Thereby, it is possible to prevent a thin film from being changed in quality due to atmospheric components.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.