Structure and the method for measuring the spectral content of an electric field as a function of position inside a plasma
US6806650B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 14, 2002 |
| Grant date | Oct 19, 2004 |
| Priority date | — |
| Expiry date | May 31, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/0062
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An RF electric field probe device for measuring an RF electric field intensity in a plasma. The device is composed essentially of an electric field sensing unit and an output unit. The electric field sensing unit is composed of a first electro-optical component positionable in the plasma and operable to modulate light as a function of variations of the RF electric field in the plasma at the fundamental frequency and harmonics of the RF electric field, and a first antenna unit electrically coupled to the first component for coupling the first component to the RF electric field. The output unit is coupled to the electric field sensing unit for providing an output signal containing information relating to the magnitude and frequency of the modulation which occurs in the first component. The probe device may be used to map a plasma region by moving the probe device to any selected point in the plasma region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.