Monitoring material buildup on system components by optical emission
US6806949B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 31, 2002 |
| Grant date | Oct 19, 2004 |
| Priority date | — |
| Expiry date | May 3, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/64
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system are provided for monitoring material buildup on system components in a plasma processing system. The system components contain emitters that are capable of producing characteristic fluorescent light emission when exposed to a plasma. The method utilizes optical emission to monitor fluorescent light emission from the emitters for determining system component status. The method can evaluate material buildup on system components in a plasma, by monitoring fluorescent light emission from the emitters. Consumable system components that can be monitored using the method include rings, shields, electrodes, baffles, and liners.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.