Patent · US Expired

Dual electron beam instrument for multi-perspective

US6812462B1 · kind B1 · utility

17Cited by
21References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 9, 2003
Grant dateNov 2, 2004
Priority date
Expiry dateMay 9, 2023

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/2815
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

Method and apparatus for imaging at multiple perspectives of a specimen are disclosed. In one embodiment, an apparatus for generating a multi-perspective image using multiple charged particle beams (e.g., electron beams) is disclosed. In one embodiment, the apparatus generally includes a charged particle beam generator system arranged to generate and control a first charged particle beam directed substantially at a first angle towards the specimen and a second charged particle beam directed substantially at a second angle towards the specimen. The apparatus also includes an image generator arranged to generate one or more images based on charged particles emitted from the specimen in response to the first and second charged particle beams and a controller arranged to cause the charged particle beam generator to direct both the first charged particle beam and the second charged particle beam at a first area of the specimen. In a specific implementation, the charged particles are in the form of electrons and the apparatus is a dual electron beam scanning electron microscope (SEM).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.