Patent · US Expired

Method for adjusting a multilevel phase-shifting mask or reticle

US6821693B2 · kind B2 · utility

0Cited by

3References

17Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Gernot Goedl · Ismaning, DE
Dirk Loeffelmacher · Taufkirchen, DE
Timo Wandel · Hersbruck, DE

Key dates

Filing date	Sep 3, 2002
Grant date	Nov 23, 2004
Priority date	—
Expiry date	Dec 31, 2022

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/143
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for adjusting (aligning) a multilevel phase-shifting mask or a multilevel phase-shifting reticle with the aid of at least one alignment mark provided on the mask or the reticle includes the steps of applying or introducing at least two alignment marks onto or into the substrate of the mask or of the reticle in a first step before the first exposure step of the mask or of the reticle, in a second step, coating at least the alignment marks produced in the first step and the regions immediately surrounding them with a thin conducting layer, and, for all following alignment steps of the plurality of mask levels, raster-scanning these alignment marks applied in the first step with an uncharged or charged particle or photon beam.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.