Radiation sensitive silicon-containing negative resists and use thereof
US6821718B2 · kind B2 · utility
5Cited by
5References
18Claims
0Family size
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Key dates
| Filing date | Sep 9, 2003 |
| Grant date | Nov 23, 2004 |
| Priority date | — |
| Expiry date | Sep 9, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A negative resist composition, comprising:(a) silicon-containing polymer with pendant fused moieties selected from the group consisting of fused aliphatic moieties, homocyclic fused aromatic moieties, and heterocyclic fused aromatic and sites for reaction with a crosslinking agent,(b) an acid-sensitive crosslinking agent, and(c) a radiation-sensitive acid generator is provided. The resist composition is used to form a patterned material layer in a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.