Determination of permeability of layer material within interconnect
US6822473B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 30, 2002 |
| Grant date | Nov 23, 2004 |
| Priority date | — |
| Expiry date | Jun 8, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/2894
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Electromigration permeability is determined for a layer material within an interconnect test structure comprised of a feeder line, a test line, and a supply line. A no-flux structure is disposed between the feeder line and the test line, and the layer material is disposed between the test line and the supply line. A respective current density and length product for each of the test line and the supply line is less than a critical Blech length constant, (J*L)CRIT. A net current density and length product (J*L)NET for the test line and the supply line is greater than the (J*L)CRIT. The electromigration permeability of the layer material is determined from an electromigration lifetime of the interconnect test structure with current flowing therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.