Flexibly suspended gas distribution manifold for plasma chamber
US6823589B2 · kind B2 · utility
236Cited by
14References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 12, 2002 |
| Grant date | Nov 30, 2004 |
| Priority date | — |
| Expiry date | Nov 25, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49826
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of flexibly mounting a gas distribution plate to the back wall of a gas inlet manifold for a plasma chamber. A perforated gas distribution plate is suspended from the back wall by flexible side walls. The flexible suspension minimizes mechanical stress due to thermal expansion of the gas distribution plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.