Substrate monitoring method and apparatus
US6824813B1 · kind B1 · utility
20Cited by
29References
40Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 6, 2000 |
| Grant date | Nov 30, 2004 |
| Priority date | — |
| Expiry date | Apr 6, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0683
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A substrate processing apparatus comprises a chamber 28 capable of processing a substrate 20. A radiation source 58 provides radiation that is at least partially reflected from the substrate in the chamber. A radiation detector 62 is provided to detect the reflected radiation and generate a signal. A controller 100 is adapted to receive the signal and determine a property of the substrate 20 in situ during processing, before an onset of during or after processing of a material on the substrate 20.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.