Inventor · Santa Clara, CA, US

Thorsten Lill

106Patents
20h-index
144Co-inventors
93Inventor score

Filing activity: Apr 17, 1998 → May 21, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US6924191B2 Method for fabricating a gate structure of a field effect transistor Electricity 409 Expired
US6081334A Endpoint detection for semiconductor processes Electricity 157 Expired
US9431268B2 Isotropic atomic layer etch for silicon and germanium oxides Electricity 126 Active
US6074954A Process for control of the shape of the etch front in the etching of polysilicon Electricity 99 Expired
US6583065B1 Sidewall polymer forming gas additives for etching processes Electricity 65 Expired
US9576811B2 Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) Electricity 59 Active
US9806252B2 Dry plasma etch method to pattern MRAM stack Electricity 54 Active
US8382999B2 Pulsed plasma high aspect ratio dielectric process Electricity 51 Active
US9257638B2 Method to etch non-volatile metal materials Electricity 51 Active
US9034199B2 Ceramic article with reduced surface defect density and process for producing a ceramic article Emerging Cross-Sectional Technologies 47 Active
US6406924B1 Endpoint detection in the fabrication of electronic devices Electricity 43 Expired
US9805941B2 Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) Electricity 41 Active
US9130158B1 Method to etch non-volatile metal materials Electricity 34 Active
US6872322B1 Multiple stage process for cleaning process chambers Electricity 30 Expired
US9870899B2 Cobalt etch back Chemistry; Metallurgy 30 Active
US9406535B2 Ion injector and lens system for ion beam milling Electricity 27 Active
US6905800B1 Etching a substrate in a process zone Electricity 25 Expired
US6518190B1 Plasma reactor with dry clean apparatus and method Electricity 22 Expired
US9536748B2 Use of ion beam etching to generate gate-all-around structure Electricity 21 Active
US6399507B1 Stable plasma process for etching of films Electricity 20 Expired
US6827869B2 Method of micromachining a multi-part cavity Performing Operations; Transporting 20 Expired
US6824813B1 Substrate monitoring method and apparatus Physics 20 Expired
US9779955B2 Ion beam etching utilizing cryogenic wafer temperatures Electricity 20 Active
US10096487B2 Atomic layer etching of tungsten and other metals Emerging Cross-Sectional Technologies 19 Active
US10374144B2 Dry plasma etch method to pattern MRAM stack Electricity 18 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.