Apparatus and method for uniform substrate heating and contaminate collection
US6825447B2 · kind B2 · utility
25Cited by
193References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 17, 2002 |
| Grant date | Nov 30, 2004 |
| Priority date | — |
| Expiry date | Dec 17, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67109
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of the invention generally provides an apparatus and method for heating substrates, comprising a heater disposed within a chamber, a plurality of heated supports movably disposed within the chamber to support at least two substrates thereon and a contamination collector disposed in communication with the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.