Gas delivering device
US6828246B2 · kind B2 · utility
2Cited by
9References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 20, 2002 |
| Grant date | Dec 7, 2004 |
| Priority date | — |
| Expiry date | Jan 9, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32449
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas delivering device inside a gaseous reaction chamber capable of increasing gas flow in areas having a deficient supply of gas by forming additional holes in corresponding positions. Because a gas-delivering panel design having asymmetrical holes is employed, gas flow rate within the reactions chamber can be roughly balanced. Hence, a homogeneous stream of gaseous reactants can be maintained above the surface of a reacting wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.