Electron beam patterning with a heated electron source
US6828996B2 · kind B2 · utility
1Cited by
13References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2001 |
| Grant date | Dec 7, 2004 |
| Priority date | — |
| Expiry date | Jan 12, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3175
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron source has an anode and a cathode that is capable of being negatively biased relative to the anode, the cathode having an electron emitting portion and a cathode axis. An electromagnetic radiation source is adapted to generate an electromagnetic radiation beam to heat the cathode. A lens is adapted to direct the electromagnetic radiation beam onto the cathode, the lens having a lens axis that forms an acute angle with, or is substantially parallel to, the cathode axis of the electron emitting portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.