Optimization of OPC design factors utilizing an advanced algorithm on a low voltage CD-SEM system
US6829380B1 · kind B1 · utility
14Cited by
17References
11Claims
0Family size
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Key dates
| Filing date | Aug 21, 2000 |
| Grant date | Dec 7, 2004 |
| Priority date | — |
| Expiry date | Jul 22, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for evaluating optical proximity corrected (OPC) designs is provided. The system includes an analysis system for performing measurements relating to a segment of a feature. The analysis system is configured to determine a first image for the segment of the feature based upon the measurements. The analysis system determines a second image to facilitate analysis of the first image and evaluates OPC designs based upon comparisons of the first and second image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.