Lithographic apparatus, magnetic support for use therein, device manufacturing method, and device manufactured thereby
US6831285B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 30, 2002 |
| Grant date | Dec 14, 2004 |
| Priority date | — |
| Expiry date | May 30, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes a support that provides a magnetic force in a first direction between a first part and a second part of the apparatus. The support comprises first, second and third magnet assemblies, the first and third magnet assemblies attached to the first part and each including at least one magnet oriented such that its magnetic polarization is substantially parallel or anti-parallel to the support direction. The first and third magnet assemblies define a space between them in a second direction that is substantially perpendicular to the first direction. The second magnet assembly is attached to the second part and includes at least one magnet. The second magnet assembly is at least partly located in the space. The at least one magnet of the second magnet assembly has its magnetic polarization oriented so as to produce a bias force substantially along the support direction by magnetic interaction between the first, second and third magnet assemblies.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.