Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
US6831768B1 · kind B1 · utility
15Cited by
2References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 31, 2003 |
| Grant date | Dec 14, 2004 |
| Priority date | — |
| Expiry date | Jul 31, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70291
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.