Apparatus and methods for improving the stability of RF power delivery to a plasma load
US6838832B1 · kind B1 · utility
17Cited by
5References
174Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 26, 2002 |
| Grant date | Jan 4, 2005 |
| Priority date | — |
| Expiry date | Apr 9, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32183
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods for improving the stability of RF power delivery to a plasma load are disclosed. The method includes adding an RF resistor and/or a power attenuator at one of many specific locations in the RF power system to lower the impedance derivatives while keeping the matching circuit substantially in tune with the RF transmission line.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.