Patent · US Expired

Multi mirror system for an illumination system

US6840640B2 · kind B2 · utility

9Cited by

19References

9Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Martin Antoni · Aalen, DE
Isabel Escudero-Sanz · Nootdorp, NL
Wolfgang Singer · Aalen, DE
Johannes Wangler · Oberkochen, DE
Jorg Schultz · Aalen, DE

Key dates

Filing date	Jan 30, 2002
Grant date	Jan 11, 2005
Priority date	—
Expiry date	Jan 30, 2022

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S359/90
WIPO fieldOptics
WIPO sectorInstruments

Abstract

There is provided a multi-mirror system for an illumination system with wavelengths ≦193 nm. The multi-mirror system includes (a) an imaging system having a first mirror and a second mirror, (b) an object plane, (c) an image plane in which the imaging system forms an image of an object, and (d) an arc-shaped field in the image plane, where a radial direction in a middle of the arc-shaped field defines a scanning direction. The first and second mirrors are arranged such that an edge sharpness of the arc-shaped field is smaller than 5 mm in the scanning direction. Rays traveling from the object plane to the image plane impinge a used area of the first and second mirrors with incidence angles relative to a surface normal of the mirrors ≦30° or ≧60°.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.