Thermal processing apparatus for substrate employing photoirradiation
US6843202B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 17, 2003 |
| Grant date | Jan 18, 2005 |
| Priority date | — |
| Expiry date | Jul 17, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A lamp house storing a plurality of flash lamps and a chamber storing and holding a semiconductor wafer are fitted to each other in an openable/closable manner. The lamp house and the chamber are fixed to a closed state with male screws. In order to process a semiconductor wafer, a shutter plate is drawn out to open an irradiation window. In this state, the shutter plate shields a space located above the male screws so that the male screws cannot be detached for opening the lamp house and the chamber. In order to open the lamp house and the chamber, the shutter plate must be inserted for shielding the irradiation window while opening the space located above the male screws. Thus, a thermal processing apparatus capable of preventing the lamps from breaking during maintenance thereof is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.