On-site cleaning gas generation for process chamber cleaning
US6843258B2 · kind B2 · utility
6Cited by
89References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 19, 2000 |
| Grant date | Jan 18, 2005 |
| Priority date | — |
| Expiry date | Dec 19, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/905
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Provided herein is a method for cleaning a process chamber for semiconductor and/or flat panel display manufacturing. This method comprises the steps of converting a non-cleaning feed gas to a cleaning gas in a remote location and then delivering the cleaning gas to the process chamber for cleaning. Such method may further comprise the step of activating the cleaning gas outside the chamber before the delivery of the gas to the chamber. Also provided is a method of eliminating non-cleaning feed gas from the cleaning gas by cryo condensation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.