Refractive index system monitor and control for immersion lithography
US6844206B1 · kind B1 · utility
73Cited by
2References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 21, 2003 |
| Grant date | Jan 18, 2005 |
| Priority date | — |
| Expiry date | Aug 21, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and/or method are disclosed for measuring and/or controlling refractive index (n) and/or lithographic constant (k) of an immersion medium utilized in connection with immersion lithography. A known grating structure is built upon a substrate. A refractive index monitoring component facilitates measuring and/or controlling the immersion medium by utilizing detected light scattered from the known grating structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.