Optical element deformation system

US6844994B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Frank Melzer · Utzmemmingen, DE
• Michael Mühlbeyer · Aalen, DE
• Bernhard Gellrich · Aalen, DE
• Franz Sorg · Aalen, DE
• Stefan Xalter · Oberkochen, DE
• Thomas Ittner · Aalen, DE

Key dates

• Filing date: Sep 19, 2001
• Grant date: Jan 18, 2005
• Expiry date: Sep 19, 2021

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B27/0068
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.