Method and apparatus for a pellicle frame with porous filtering inserts
US6847434B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2002 |
| Grant date | Jan 25, 2005 |
| Priority date | — |
| Expiry date | Dec 9, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.