Composition and process for wet stripping removal of sacrificial anti-reflective material
US6849200B2 · kind B2 · utility
29Cited by
22References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 23, 2002 |
| Grant date | Feb 1, 2005 |
| Priority date | — |
| Expiry date | Aug 6, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02063
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A composition and process for wet stripping removal of sacrificial anti-reflective silicate material, e.g., from a substrate or article having such material deposited thereon, particularly where the sacrificial anti-reflective material is present with permanent silicate materials desired to be unaffected by the wet stripping composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.