David Bernhard
28Patents
14h-index
33Co-inventors
77Inventor score
Filing activity: Mar 31, 2000 → Dec 2, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6773873B2 | pH buffered compositions useful for cleaning residue from semiconductor substrates | Chemistry; Metallurgy | 65 | Expired |
| US6896826B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | Chemistry; Metallurgy | 44 | Expired |
| US6692546B2 | Chemical mechanical polishing compositions for metal and associated materials and method of using same | Chemistry; Metallurgy | 42 | Expired |
| US6344432B1 | Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures | Electricity | 35 | Expired |
| US8236485B2 | Photoresist removal | Emerging Cross-Sectional Technologies | 31 | Expired |
| US7029373B2 | Chemical mechanical polishing compositions for metal and associated materials and method of using same | Chemistry; Metallurgy | 31 | Expired |
| US7300601B2 | Passivative chemical mechanical polishing composition for copper film planarization | Electricity | 30 | Expired |
| US6755989B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | Chemistry; Metallurgy | 29 | Expired |
| US6849200B2 | Composition and process for wet stripping removal of sacrificial anti-reflective material | Electricity | 29 | Expired |
| US6800218B2 | Abrasive free formulations for chemical mechanical polishing of copper and associated materials and method of using same | Electricity | 24 | Expired |
| US8058219B2 | Metals compatible post-etch photoresist remover and/or sacrificial antireflective coating etchant | Chemistry; Metallurgy | 22 | Active |
| US7888301B2 | Resist, barc and gap fill material stripping chemical and method | Chemistry; Metallurgy | 19 | Expired |
| US8338087B2 | Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate | Chemistry; Metallurgy | 19 | Expired |
| US8951948B2 | Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition | Chemistry; Metallurgy | 18 | Active |
| US6458984B1 | Chemical method for removal and analysis of boron impurities in tetraethylorthosilicate (TEOS) | Chemistry; Metallurgy | 10 | Expired |
| US7994108B2 | Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings | Physics | 8 | Expired |
| US6967169B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | Chemistry; Metallurgy | 7 | Expired |
| US7605113B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | Chemistry; Metallurgy | 7 | Expired |
| US6660700B2 | Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures | Electricity | 6 | Expired |
| US7662762B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates | Chemistry; Metallurgy | 2 | Expired |
| US8679734B2 | Photoresist removal | Emerging Cross-Sectional Technologies | 1 | Active |
| US9256134B2 | Photoresist removal | Emerging Cross-Sectional Technologies | 1 | Active |
| US7678393B1 | Mixture composition and method useful for topical and internal application | Human Necessities | 1 | Active |
| US9669000B2 | Pharmaceutical compositions comprising lignans and their derivatives for treating hyperplastic diseases | Human Necessities | 0 | Active |
| US9422513B2 | Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.