Single-tube interlaced inductively coupling plasma source
US6855225B1 · kind B1 · utility
19Cited by
6References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 24, 2003 |
| Grant date | Feb 15, 2005 |
| Priority date | — |
| Expiry date | Jun 15, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma source for use in, for example, semiconductor processing contains a radio-frequency generator, an impedance matching network, and a coil that encloses a tube. The coil is bifilar, i.e., the turns of one are interlaced with the turns of a second winding. The matching network supplies only a single coil in the plasma source, unlike conventional arrangements wherein a single matching network supplies multiple coils in the plasma source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.