Patent · US Expired

Objective lens for an electron microscopy system and electron microscopy system

US6855938B2 · kind B2 · utility

44Cited by
9References
51Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 16, 2003
Grant dateFeb 15, 2005
Priority date
Expiry dateJul 16, 2023

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/31749
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

An objective lens with magnetic and electrostatic focusing for an electron microscopy system is provided whose at least partially conical outer shape allows orienting an object to be imaged at a large angle range in respect of an electron beam, said objective lens exhibiting, at the same time, good optical parameters. This is enabled by a specific geometry of the lens elements. Furthermore, an examination for the simultaneous imaging and processing of an object is proposed which comprises, besides an electron microscopy system with the above-mentioned objective lens, also an ion beam processing system and an object support.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.