Illumination system particularly for microlithography

US6859328B2 · kind B2 · utility

Assignee

• Carl Zeiss Semiconductor · DE

Inventors

• Jorg Schultz · Aalen, DE
• Johannes Wangler · Oberkochen, DE
• Karl-Hein Schuster · Oberkochen, DE
• Udo Dinger · Oberkochen, DE
• Wolfgang Singer · Aalen, DE
• Martin Antoni · Aalen, DE
• Hans-Juergen Mann · Oberkochen, DE
• Wilhelm Ulrich · Aalen, DE

Key dates

• Filing date: Jul 22, 2002
• Grant date: Feb 22, 2005
• Expiry date: Jan 16, 2023

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K1/062
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A projection exposure apparatus for microlithography using a wavelength≦193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.