Substrate processing system and substrate processing method
US6861371B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 1, 2002 |
| Grant date | Mar 1, 2005 |
| Priority date | — |
| Expiry date | Nov 1, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/905
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention provides a substrate processing system and method which can prevent the filter from being stuffed with foreign objects and make the filter accordingly more durable.The substrate processing system 12 comprising a substrate processing unit 46 for processing substrates W with a processing liquid, and a processing liquid recovery passage 75 for passing the processing liquid discharged from the substrate processing unit 46, in which the processing liquid recovery passage 75 includes a filter 80 for removing foreign objects mixed in the processing liquid, a cleaning fluid supply passage 120 for feeding a cleaning fluid for cleaning the filter 80, and a discharge passage 115 for discharging the processing liquid and the cleaning fluid from the filter 80.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.