Method and apparatus for providing and integrating a general metal delivery source (GMDS) with atomic layer deposition (ALD)
US6863021B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 14, 2002 |
| Grant date | Mar 8, 2005 |
| Priority date | — |
| Expiry date | Jan 4, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4488
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A General Metal Delivery Source (GMDS) for delivery of volatile metal compounds in gaseous form to processing apparatus has a reaction chamber holding a solid metal source material and connecting to the processing apparatus, and having an outlet for provision of the volatile metal compounds, a source heater coupled to the reaction chamber for heating said solid metal source material, a gas source for providing a reactive gas, a gas delivery conduit from the gas source to the reaction chamber for delivering gas species to the reaction chamber; and a plasma generation apparatus coupled to the gas delivery conduit. The plasma generation apparatus dissociates reactive gas molecules providing monatomic reactive species to the reaction chamber, and the monatomic reactive species combine with metal from the heated solid metal source material forming the volatile metal compounds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.