Linear drive system for use in a plasma processing system
US6863784B2 · kind B2 · utility
11Cited by
18References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 5, 2003 |
| Grant date | Mar 8, 2005 |
| Priority date | — |
| Expiry date | Nov 5, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32568
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing system for processing a substrate is disclosed. The system includes a process component capable of effecting a plasma inside a process chamber. The system also includes a gear drive assembly for moving the process component in a linear direction during processing of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.