Iced film substrate cleaning
US6864458B2 · kind B2 · utility
6Cited by
12References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 21, 2003 |
| Grant date | Mar 8, 2005 |
| Priority date | — |
| Expiry date | Oct 16, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/1121
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Apparatus for cleaning a surface of a substrate includes a cooling device, which is adapted to cool a region of the substrate in a vicinity of a particle on the surface, so as to cause a fluid in contact with the surface to form a frozen film in the vicinity of the particle. A radiation source is adapted to direct a beam of energy toward the surface so as to cause vaporization of the film due to absorption of the beam in the film, thereby facilitating removal of the particle from the surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.