Amir Widmann
19Patents
7h-index
37Co-inventors
62Inventor score
Filing activity: Jan 21, 2003 → Apr 27, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8175831B2 | Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers | Electricity | 34 | Active |
| US8559001B2 | Inspection guided overlay metrology | Electricity | 27 | Active |
| US7561282B1 | Techniques for determining overlay and critical dimension using a single metrology tool | Physics | 26 | Active |
| US8111376B2 | Feedforward/feedback litho process control of stress and overlay | Physics | 19 | Active |
| US9116442B2 | Feedforward/feedback litho process control of stress and overlay | Physics | 15 | Active |
| US7925486B2 | Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout | Physics | 12 | Active |
| US9170209B1 | Inspection guided overlay metrology | Electricity | 9 | Active |
| US6864458B2 | Iced film substrate cleaning | Electricity | 6 | Expired |
| US9329033B2 | Method for estimating and correcting misregistration target inaccuracy | Physics | 6 | Active |
| US8948495B2 | Inspecting a wafer and/or predicting one or more characteristics of a device being formed on a wafer | Physics | 5 | Active |
| US9558978B2 | Material handling with dedicated automated material handling system | Emerging Cross-Sectional Technologies | 4 | Active |
| US8045786B2 | Waferless recipe optimization | Physics | 4 | Active |
| US8655469B2 | Advanced process control optimization | Physics | 3 | Active |
| US8804137B2 | Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability | Electricity | 2 | Active |
| US9576861B2 | Method and system for universal target based inspection and metrology | Physics | 2 | Active |
| US10649447B2 | Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers | Electricity | 1 | Active |
| US7679069B2 | Method and system for optimizing alignment performance in a fleet of exposure tools | Physics | 1 | Active |
| US11498189B2 | Wrench | Performing Operations; Transporting | 0 | Active |
| US9651943B2 | Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.