Stage apparatus, exposure apparatus and method for exposing substrate plate
US6864955B2 · kind B2 · utility
20Cited by
17References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 11, 2003 |
| Grant date | Mar 8, 2005 |
| Priority date | — |
| Expiry date | Feb 11, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6838
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The stage apparatus has a movable stage structure body which holds a substrate plate to be processed and is movable on a base structure body. This stage apparatus comprises a receipt edge orifice disposed at least at a portion of a fluid path which is disposed at said stage structure body; and a feed edge orifice being detachably engageable with said receipt edge orifice at a predetermined position on a base structure body and providing or discharging a predetermined fluid to the receipt edge orifice during said engagement of said feed edge orifice with said receipt edge orifice.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.